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PCT’s Megasonic cleaning is the most advanced solution for achieving HyperClean™ semiconductor wafers available today. It has become the new standard for constant-temperature baths.
PCT’s Megasonic Quick Dump Rinser construction exceeds the most stringent demands of today’s wafer fabrication facilities.
The Megasonic Quick Dump Rinser from PCT is available in a variety of vessel materials, and has four-side overflow. It is designed for low water volume, while providing the ultimate in megasonic cleaning.
Removable energy window (plastic units only)
Frequency range of 450 KHz – 1 MHz at resonant levels
Vessel material of poly, quartz, PVDF, or stainless steel, PFA
Megasonic-assisted rinsing using multiplexed transducers
Low water volume
Integrated control system
49000 Milmont Dr. Fremont CA 94538
510-657-4412 • email@example.com
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