Ultrasonic Cleaning Process Tanks- PCT Systems

Quanta-Clean Ultrasonic Cleaning & Process Tanks For Precision Cleaning Applications

PCT now offers Ultrasonic Cleaning and Process Tanks to address customer requirements for high performance ultrasonic equipment designed specifically for “Critical Clean” applications. PCT’s new Quanta-Clean Tanks complement our full line of Megasonic solutions and provide OEMs a single source for precision cleaning systems and components. Finally, an Ultrasonic solution that carries PCT‘s renowned quality, price and performance.

PCT Quanta-Clean Product Features

Our state-of-the-art Quanta-Clean ultrasonic generator is 30% smaller, and operates 10% cooler and 10% more efficient (with >85% power conversion) than other ultrasonic products on the market.

  • Power factor correction
  • Limited 2 Year Warranty
  • Customizable tank configurations

Specifications

Sweep Bandwidth 4-6 kHz - dependent on operating frequency
Sweep Modulation (optional) 300-1000 Hz programmable
Input Power 90-240 VAC
Generator Wattage Options 250, 500, or 1000 watt
Frequencies (choice of 1) 40 kHz, 68 kHz, or 170 kHz
Tank Material of Construction 316L Stainless Steel Tank Options
Tank Configurations (WxLxH Dimensions) 8” x 8” x 10” Single 6” Wafer Carrier
8” x 16” x 10” Dual 6” Wafer Carrier
11” x 12.5” x 13” Single 8” Wafer Carrier
Custom Sizes Also Available

When to use Ultrasonic Cleaning vs. Megasonic Cleaning Systems

Megasonic and Ultrasonic Cleaning are both helpful for particle removal applications, and enhancing the speed and effect of most diffusion limited chemical reactions. Both have also demonstrated enhanced chemical residual removal for rinse applications. So how do you know when to use Ultrasonics or Megasonics? Here are a few good rules to determine which frequency is right for your application.

Ultrasonic Cleaning Applications Megasonic Applications
Large particle removal typically >5µm Small Particle removal typically 30nm - 5µm
Robust Substrates Sensitive Substrates or Structures
Heavy films or gross contamination Heat Sensitive Substrates
Photoresist Removal – Metal Lift Off Post Photoresist Removal Clean
Multi-Surface Cleaning Line of Sight Cleaning